Workers at Carl Zeiss ZMT are seen outside giant vacuum

Workers at Carl Zeiss ZMT are seen outside giant vacuum chambers where optical systems for ASML’s new High NA EUV tool are tested. ASML is rolling out its newest product line, High NA EUV lithography tools, which cost more than $350 million each and will be used by leading semiconductor manufacturers to help make new generations of smaller and better computer chips in Oberkochen, Germany, December 12, 2023. ASML/ZEISS/Handout via REUTERS